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An Intelligent Neural Network Controlled Atmospheric Pressure Spatial Atomic Layer Deposition System for Tunable Metal Oxide Thin Films

颁布单位：[University of Waterloo] | 颁布时间：2018 | 实施时间：2018 | 学科分类：[Atmospheric, Pressure, Spatial, Atomic, Layer, Deposition, Zinc Oxide, Thin, Film, Neural Network, Machine Learning, In Situ, Characterization, Tauc-Lorentz]

预览 | 原文链接 [浏览：60 下载：121]
High-κ Complex Oxides for Advanced Gate Dielectric Applications Grown by Atomic Layer Deposition

颁布单位：[University of Alberta] | 颁布时间：2016 | 实施时间：2016 | 学科分类：[Complex, Oxide, High-K, Oxide, Atomic, Layer, Deposition]

预览 | 原文链接 [浏览：3 下载：2]
Low Temperature Plasma Enhanced Atomic Layer Deposition of Conducting Zirconium Nitride: In-situ growth characterization, recipe development, and the sources of oxygen contamination in films

颁布单位：[University of Alberta] | 颁布时间：2015 | 实施时间：2015 | 学科分类：[Spectroscopic, Ellipsometry, Atomic, Layer, Deposition, ALD, Process, Optimization, Conducting, Zirconium, Nitride, Growth]

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Materials Characterization and Growth Mechanisms of ZnO, ZrO2, and HfO2 Deposited by Atomic Layer Deposition

颁布单位：[University of Alberta] | 颁布时间：2014 | 实施时间：2014 | 学科分类：[Density, Functional, Theory, Growth, Mechanism, Atomic, Layer, Deposition, Zinc, Oxide, Zirconium, Oxide, Hafnium, Oxide]

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