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Zirconium

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Low Temperature Plasma Enhanced Atomic Layer Deposition of Conducting Zirconium Nitride: In-situ growth characterization, recipe development, and the sources of oxygen contamination in films

颁布单位：[University of Alberta] | 颁布时间：2015 | 实施时间：2015 | 学科分类：[Spectroscopic, Ellipsometry, Atomic, Layer, Deposition, ALD, Process, Optimization, Conducting, Zirconium, Nitride, Growth]

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Materials Characterization and Growth Mechanisms of ZnO, ZrO2, and HfO2 Deposited by Atomic Layer Deposition

颁布单位：[University of Alberta] | 颁布时间：2014 | 实施时间：2014 | 学科分类：[Density, Functional, Theory, Growth, Mechanism, Atomic, Layer, Deposition, Zinc, Oxide, Zirconium, Oxide, Hafnium, Oxide]

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