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Low Temperature Plasma Etching Control through Ion Energy Angular Distribution and 3-Dimensional Profile Simulation.
颁布单位:[University of Michigan] | 颁布时间:2015 | 实施时间:2015 | 学科分类:[plasma etching, wafer fabrication, ion energy angular distribution, profile simulation, plasma physics and chemistry, Electrical Engineering, Engineering, Electrical Engineering]
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[浏览:22 下载:23]
Neuromorphic Computing with Resistive Switching Devices.
颁布单位:[University of Michigan] | 颁布时间:2015 | 实施时间:2015 | 学科分类:[Neuromorphic Computing, Resistive Switching, Memristor, RRAM, Analog Computing, Electrical Engineering, Engineering, Electrical Engineering]
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