A comparison of AB diblock and ABA triblock copolymers of polystyrene and polyferocenylsilane for nanolithography applications

[摘要] Block coopolymers(BCP) have become of interest in the pursuit novel methods of nanolithography. Their ability to self-assembly into periodic geometries with nanoscale feature sizes makes them attractive as etching masks and templating materials for microelectronics and nanodevices. BCP provide a scalable and low-cost method that is compatible with existing semiconductor fabrication technologies. Though various studies have looked at several combinations of block copolymers we focus on the use of solvent annealing as a method to tune the morphology of PS-b-PFS and PS-b- PFS-b-PS block copolymers. These polymers have shown promise as precursors to a variety of materials and in particular this combination of block copolymers is attractive because we have at our dispossible etching methods with a high selectivity between these two polymers.

[发布机构] Massachusetts Institute of Technology