Final report for ER54440, ''Measurement and modeling of low energy (910 to 1000 eV) sputtering and reflection''

[摘要] This report is a compilation of the three annual progress reports. All detail can be found in the refereed publications enumerated within.

[发布日期] 2000-11-20 [发布机构] University of Illinois, Urbana, IL (United States)

[关键词] 70 Plasma Physics And Fusion Technology;Sputtering;Reflection;Progress Report;Simulation