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Adsorption mechanism of gallium(III) and indium(III) onto gamma-Al2O3
[摘要] The adsorption mechanism of trivalent Ga and In onto gamma-Al2O3 was investigated using a triple-layer model simulation and pressure-jump technique, Bidentate Ga3+ and In3+ and monodentate GaOH2+/InOH2+ are the most likely surface species responsible for Ga(III)/In(III) adsorption, Sorption of Ga(III) and In(III) can be interpreted as an associative process, The adsorption pathway is a two-step mechanism: proton release from surface hydroxyl group(s) followed by coordination of Ga(III)/In(III) species to the depronated site(s), Intrinsic adsorption rate constants cannot be estimated with a liner free-energy relationship between the adsorption rate constant and the rate of water exchange, which is developed solely based on the dissociative sorption mechanism of divalent ions. (C) 1997 Academic Press.
[发布日期] 1997-04-01 [发布机构] 
[效力级别]  [学科分类] 
[关键词] Ga(III);In(III);gamma-Al2O3;adsorption;water exchange rate;linear free energy;intrinsic adsorption rate constants [时效性] 
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