Kinetic effects of inclined magnetic field on physical sputtering by impurity ions

[摘要] Sputtering caused by particle flux onto plasma-facing components is an essential physics for impurity transport codes. Velocity distribution of incident particles was obtained to calculate the yield from fluid quantities, i.e. plasma density and temperature. Effects of inclined magnetic field on incident angle distribution of impurity ions and sputtering yield were investigated with the aid of a particle tracing code with background electric field calculated by a PIC (Particle-In-Cell) simulation code. Simulations with various magnetic field angle and combination of projectile and target atoms were carried out. The most prominent parameter enhancing the yield is magnetic field angle. Large angle from the surface normal causes 3-5 times larger yield especially in the case of self sputtering. In the case of small mass ratio such as carbon on tungsten, the enhancement effect of the magnetic field is weak. (C) 2013 Elsevier B. V. All rights reserved.

[发布日期] 2013-07-01

[效力级别]  Proceedings Paper