AN AB-INITIO MONTE-CARLO STUDY OF LOW-ENERGY POSITRON AND ELECTRON IMPLANTATION IN ELEMENTAL METALS AND MULTILAYERS

[摘要] A Monte Carlo code developed at Brookhaven to study positron and electron implantation in solids will be discussed. This code models the trajectories of a large number of positrons or electrons as they move through the material and uses this information to calculate stopping profiles, backscattered fractions and transmitted fractions. The particle-atom interactions are incorporated via elastic and inelastic scattering cross-sections. The incident particle energies vary from 1 to 10 keV and the simulation stops when the particle energy goes down to 25 eV or if the particle is backscattered. Main results of our Monte Carlo simulations of the mean implantation depth and implantation profiles for both semi-infinite metallic elements and multilayers will be discussed.

[发布日期] 1994-05-01