TIME-OF-FLIGHT HEAVY-ION BACKSCATTERING SPECTROMETRY

[摘要] A new time-of-flight (TOF) ion detection system for heavy ion backscattering spectrometry (HIBS) is described and examples are given of the use of the system for measuring low-level contamination on Si wafers. Currently, the TOF-HIBS system has a sensitivity of 1 x 10(9)/cm2 for the heaviest of surface impurity atoms and a mass resolution capable of separating Fe from Cu. The sensitivity is expected to improve by an additional order of magnitude with three parallel detectors in an optimized configuration.

[发布日期] 1994-03-01

[效力级别]  Proceedings Paper