PHOTOLUMINESCENCE AND STRUCTURAL CHARACTERIZATION OF MEV ERBIUM-IMPLANTED SILICA GLASS

[摘要] Suprasil glass (amorphous SiO2) has been implanted with 2.9 MeV Er ions at fluences of 3.4 x 10(15) and 3.4 x 10(16) ions/cm2. Photoluminescence spectra of implanted samples show a clear luminescent transition around lambda = 1.54-mu-m, corresponding to an intra-4f transition of Er3+. Flourescence decay times are in the range 1-8 ms, depending on implantation fluence and annealing treatment. UV absorption and IR reflection spectroscopy are employed to characterize beam-induced defects in the silica network. The results indicate that defects in the silica network play an important role in the energy transfer processes in the Er: silica system.

[发布日期] 1991-07-01

[效力级别]  Proceedings Paper