Hollow-cathode chemical vapor deposition of thick, low-stress diamond-like carbon films

[摘要] A radio-frequency (RF), hollow-cathode plasma source with confining magnetic field is described for the chemical vapor deposition of thick (> 10 mu m), amorphous diamond-like carbon ablator films for inertial confinement fusion applications. Plasma is characterized by optical emission spectroscopy, while properties of the resultant films are measured by a combination of profilometry, Rutherford backscattering spectrometry, elastic recoil detection analysis, X-ray diffraction, Raman spectroscopy, and atomic force microscopy. The dependence of the deposition rate, film density, elemental composition, self-bias and residual stress is reported as a function of RF power. Higher density films were found when using Ar plasma, than N-2 or H-2 plasma. The coatings produced are x-ray amorphous, exhibit low compressive stress (similar to 100 MPa), high density (< 1.7 g/cm(3)), hydrogen content of similar to 30 at.%, and a low average roughness of 0.75 nm. Applications of these films as tunable-density ablators for inertial confinement fusion experiments are discussed.

[发布日期] 2020-11-30

[关键词] Diamond-like carbon;Coatings;Plasma chemical vapor deposition;Amorphous hydrogenated carbon