Growth kinetics of ion beam sputtered Al-thin films by dynamic scaling theory

[摘要] This paper reports the study of growth kinetics of ion beam sputtered aluminum thin films. Dynamic scaling theory was used to derive the kinetics from atomic force microscopy (AFM) measurements. AFM imaging revealed that surface incorporates distinctly different morphologies. Variation in deposition times resulted in such distinctiveness. The growth governing static (alpha) as well as dynamic (beta) scaling exponents has been determined. The exponent a decreased as the deposition time increased from 3 to 15 min. Consequently, the interfacial width (xi) also decreased with critical length (L-c), accompanied with an increase in surface roughness. Surface diffusion becomes a major surface roughening phenomenon that occurs during deposition carried out over a short period of 3 min. Extension of deposition time to 15 min brought in bulk diffusion process to dominate which eventually led to smoothening of a continuous film. (C) 2014 Elsevier B.V. All rights reserved.

[发布日期] 2014-12-31

[关键词] Ion beam sputter deposition;Dynamic scaling theory;Growth kinetics;Static and dynamic scaling constant;Scaling phenomenon