The formation of low-dimensional structures by compressive plasma flows

[摘要] The process of the deposition of low-dimensional structures on the silicon surface exposed to the compression plasma flow has been studied. Scanning electron microscopy, transmission electron microscopy and Rutherford backscattering spectroscopy have been used to analyze the morphology, microstructure and elemental composition of the near-surface layer. The deposited coating consists of a spherical metal containing particles with a size of 50-200 nm. Possible mechanism of the coating formation is discussed. (c) 2005 Elsevier B.V. All rights reserved.

[发布日期] 2005-10-01

[效力级别]  Proceedings Paper

[关键词] X low-dimensional coating deposition;scanning electron microscopy;transmission electron microscopy;rutherford backscattering spectroscopy;pulsed plasma;silicon