Formation of Ti-Al-N thin films by the dynamic ion mixing method

[摘要] Aluminium titanium nitride (Ti-Al-N) is anticipated as an advanced coating film with wear resistance used for drills, bites etc. and with corrosion resistance at a high temperature. Almost all the formations of Ti-Al-N films reported in the literature had been carried out by a reactive sputtering method. Delicate control for the composition of a Ti-Al-N film is difficult for the reactive sputtering method because of using the Ti-Al target made with a fixed composition. The dynamic ion mixing method used in this experiment can finely control the film composition using two electron beam evaporation sources, thereby setting the Ti and Al contents. In this study, the composition and chemical state of Ti-Al-N thin films are measured using X-ray photoelectron spectroscopy. When the Ti-Al-N thin film has a Ti:Al:N composition ratio of 1:1:1, the chemical shifts of the Ti 2p and the Al 2p line are 0.9 eV and 1.2 eV from the metallic states of Ti and Al respectively. These chemical shifts are smaller than those of standard TiN and AlN, because one nitrogen atom joins to both a titanium atom and an aluminum atom. The functional properties of Ti-Al-N thin films prepared by the dynamic ion mixing method at various energies are investigated with respect to hardness, wear resistance and corrosion resistance, The highest hardness and the highest corrosion resistance of Ti-Al-N thin films are observed for an ion beam energy of 10 keV. In the case of the wear resistance, the friction coefficient may be independent of the ion beam energy.

[发布日期] 1996-10-01

[效力级别]  Proceedings Paper

[关键词] Ti-Al-N thin film;dynamic ion beam mixing