Plasma source ion implantation of metal ions: Synchronization of cathodic-arc plasma production and target bias pulses

[摘要] An erbium cathodic-arc has been installed on a plasma source ion implantation (PSII) experiment to allow the implantation of erbium metal and the growth of adherent erbia (erbium oxide) films on a variety of substrates. The operation of the PSII pulser and the cathodic-arc are synchronized to achieve pure implantation, rather than the hybrid implantation/deposition being investigated in other laboratories. The relative phase of the 20 mu s PSII and the cathodic-arc pulses can be adjusted to tailor the energy distribution of the implanted ions and suppress the initial high-current drain on the pulse modulator. We present experimental data on this effect and make a comparison with the results from particle-in-cell simulations.

[发布日期] 1996-11-01

[效力级别]  Proceedings Paper

[关键词] vacuum are;cathodic are;plasma source ion implantation;metal;plasma;erbium