ANALYSIS OF RF-SPUTTERED TIB2 HARD COATINGS BY MEANS OF X-RAY-DIFFRACTOMETRY AND AUGER-ELECTRON SPECTROSCOPY

[摘要] The bias voltage can be a very important parameter in r.f. sputtering. Auger electron spectroscopy (AES) and X-ray diffraction (XRD) were used to investigate the influence of this parameter of TiB2 hard coatings. As a result of the AES measurements the boron-to-titanium ratio depends on the bias voltage. With XRD, significant differences in the various coatings can be observed.

[发布日期] 1991-07-01

[效力级别]  Proceedings Paper