A snapback-free and fast-switching planar-gate SOI LIGBT with three electron extracting channels
[摘要] In this paper, a snapback-free and fast-switching SOI LIGBT with three electron extracting channels (TEC) is proposed and investigated. Compared with SBM LIGBT, the trench gate of n-MOS is changed to a planar gate, and a P- region is added to prevent N+ short circuit while providing electron extracting channel. Simulation results show that TEC decreases EOFF by 15% at VON=1.8V relative to SBM when all three channels are open, while TEC still decreases EOFF by 10% at VON =1.55V relative to SBM when only two channels are available. The device achieves the same breakdown voltage level of 603V as SBM without additional trench etch process required.
[发布日期] [发布机构]
[效力级别] [学科分类] 电子、光学、磁材料
[关键词] fast-switching;snapback-free;silicon-on-insulator lateral insulated gate bipolar transistor (SOI LIGBT);three electron extracting channels;planar gate [时效性]