Nanosphere lithography based technique for fabrication of large area, well

[摘要] Nanosphere lithography is an effective technique for high throughput fabrication of well-ordered patterns, but expanding the method to large area coverage of nanoparticles less than 300 nm in diameter while maintaining good order has proven challenging. Here we demonstrate a nanosphere lithography based technique for fabricating large area, well-ordered arrays of hemispherical metal particles which pushes the limits of these size constraints. First, large area monolayers of polystyrene (PS) nanospheres are assembled at an air-water interface and then transferred to a submerged substrate. The submerged substrate is supported at a 10o angle so that the water draining speed can be used to control the transfer rate, which is essential for hydrophobic substrates such as the polymer-coated glass used in our work. A double liftoff procedure was used to transfer the PS pattern to a silver particle array on an arbitrary substrate, achieving tunable control over the final metal particle diameter and spacing in the range of 50-150 nm and 100-200 nm, respectively. Additional control over particle shape and diameter can be obtained by modifying the substrate surface energy. For example, depositing silver on ITO-coated glass rather than a more hydrophilic clean glass substrate leads to a more hemispherical particle shape and a diameter reduction of 20%. Peak wavelength- selective reflection greater than 70% and total extinction greater than 90% were measured. The intensity, position and bandwidth of the main plasmon resonance of the arrays were shown to have minimal angle dependence up to at least 30o off normal.

[发布机构] HP Development Company

[学科分类] 计算机科学（综合）

[关键词] nanosphere lithography;plasmonics;nanoparticle;nanofabrication