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Surface Passivation by Quantum Exclusion Using Multiple Layers
[摘要] A semiconductor device has a multilayer doping to provide improved passivation by quantum exclusion. The multilayer doping includes a plurality M of doped layers, where M is an integer greater than 1. The dopant sheet densities in the M doped layers need not be the same, but in principle can be selected to be the same sheet densities or to be different sheet densities. M-1 interleaved layers provided between the M doped layers are not deliberately doped (also referred to as "undoped layers"). Structures with M=2, M=3 and M=4 have been demonstrated and exhibit improved passivation.
[发布日期] 2013-03-12 [发布机构] 
[效力级别]  [学科分类] 物理(综合)
[关键词]  [时效性] 
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