Nanofabrication by means of focused ion beam

[摘要] Focused ion beam (FIB) systems have been used widely in micro/nano technology due to their unique capabilities. In this fabrication technique, ions are accelerated towards the sample surfaces and substrate atoms are removed. Despite the ubiquity of this method, several problems remain unsolved and are not fully understood. In this thesis, the effects of FIB machining and its halo effects on substrate are investigated. A novel detector which can perform measurements of the current density profile of the generated beam, was successfully demonstrated.The effect of ion solid interactions for 30keV Ga FIB are investigated through atomic force microscopy (AFM) and Raman spectroscopy, for various machining parameters such as current, dwell time and pixel spacing.The FIB implanted regions were also studied for use as a hard mask in plasma etching, and was found to be suitable for high speed patterning in large area fabrication of nano-featured surfaces for metamaterials. It was observed by controlling the implantation parameters, the ultra-thin structures could be made. These structures have wide range of applications such as nano-scale resonators with application of chemical and biological sensing, membranes with nano-pores for DNA translocation and fabrication of near field optical devices.

[发布机构] University:University of Birmingham;Department:School of Engineering, Department of Mechanical Engineering

[关键词] T Technology;TJ Mechanical engineering and machinery