Resistor trimming geometry; past, present and future

[摘要] This paper explores the key developments in thin film resistive trimming geometry for use in the fabrication of discrete precision resistors. Firstly an introduction to the laser trimming process is given with respect to well established trim geometries such as the plunge, 'L' and serpentine cuts. The effect of these trim patterns on key electrical properties of resistance tolerance and temperature co-efficient of resistance (TCR) of the thin films is then discussed before the performance of more recent geometries such as the three-contact and random trim approaches are reviewed. In addition to the properties of the standard trim patterns, the concept of the heat affected zone (HAZ) and ablation energy and the effect of introducing a 'fine' trim in areas of low current density to improve device performance are also studied. It is shown how trimming geometry and laser parameters can be systematically controlled to produce thin film resistors of the required properties for varying applications such as high precision, long term stability and high power pulse performance.

[发布机构] Faculty of Engineering and Environment, Northumbria University, Newcastle-upon-Tyne; NE1 8ST, United Kingdom^1

[关键词] Device performance;High-power pulse;Laser parameters;Long term stability;Low current density;Precision resistors;Temperature coefficient;Thin film resistors