Temperature-dependence of Threshold Current Density-Length Product in Metallization Lines: A Revisit

[摘要] One of the important phenomena in Electromigration (EM) is Blech Effect. The existence of Threshold Current Density-Length Product or EM Threshold has such fundamental and technological consequences in the design, manufacture, and testing of electronics. Temperature-dependence of Blech Product had been thermodynamically established and the real behavior of such interconnect materials have been extensively studied. The present paper reviewed the temperature-dependence of EM threshold in metallization lines of different materials and structure as found in relevant published articles. It is expected that the reader can see a big picture from the compiled data, which might be overlooked when it was examined in pieces.

[发布机构] Universitas Indonesia, Depok; 16424, Indonesia^1;University of Texas at Arlington, TX; 76019, United States^2

[效力级别] 化学

[关键词] Blech effect;Interconnect materials;Temperature dependence