Chemical Etching of {hk0} Silicon Plates in EDP Part I: Experiments and Comparison with TMAH

[摘要] This paper deals with the anisotropic chemical etching of various silicon plates etched inEDP. Changes with orientation in geometrical features of etched surface and in theetching shape of starting circular sections are systematically investigated. These etchingshapes are compared with shapes produced by etching in KOH and TMAH solutions;This experimental study allows us to determine the dissolution slowness surface for theEDP solution and to investigate the real influence of the etchant on two dimensional andthree dimensional etching shapes.

[学科分类] 电子、光学、磁材料