Atomic Layer Deposition for the Conformal Coating of Nanoporous Materials

[摘要] Atomic layer deposition (ALD) is ideal for applying precise andconformal coatings over nanoporous materials. We have recentlyusedALDto coat two nanoporous solids: anodic aluminum oxide(AAO) and silica aerogels.AAOpossesses hexagonally orderedpores with diametersd∼40nm and pore lengthL∼70microns. TheAAOmembranes were coated byALDto fabricate catalytic membranes that demonstrate remarkable selectivity in theoxidative dehydrogenation of cyclohexane. AdditionalAAOmembranes coated withALDPd films show promise as hydrogensensors. Silica aerogels have the lowest density and highestsurface area of any solid material. Consequently, these materialsserve as an excellent substrate to fabricate novel catalyticmaterials and gas sensors byALD.

[学科分类] 材料工程