Field Effect on Crystal Phase of Silicon in Si/CeO2/SiO2Structure

[摘要] The structural, optical, and conductivity properties of silicon film deposited on cerium dioxide buffer layer were studied. The electronic structure of system consists of various defect levels inside band gap. The temperature spatial distribution plays a great role in silicon crystallization. The field destruction of crystal phase and its restoration, after annealing, were investigated.

[学科分类] 材料工程