Surface and Interface Properties of 10–12 Unit Cells Thick Sputter Deposited Epitaxial CeO2Films

[摘要] Ultrathin and continuous epitaxial films with relaxed lattice strain can potentially maintain more of its bulk physical and chemical properties and are useful as buffer layers. We study surface, interface, and microstructural properties of ultrathin(∼10–12 unit cells thick) epitaxial ceria films grown on single crystal YSZ substrates. The out-of -plane and in-plane lattice parameters indicate relaxation in the continuous film due to misfit dislocations seen by high-resolution transmission electron microscopy (HRTEM) and substrate roughnessof∼1-2 unit cells, confirmed by atomic force microscopy and HRTEM. A combination of secondary sputtering, lattice mismatch, substrate roughness, and surface reduction creating secondary phasewas likely the cause of surface roughness which should be reduced to a minimum level for effective use of it as buffer layers.

[学科分类] 材料工程