nm- andμm-Scale Surface Roughness on Glass with Specific Optical Scattering Characteristics on Demand

[摘要] During maskless ion etching of amorphous glass, self-organizationcan arise in certain etch parameter ranges,which leads to dense-lying dots/cones with typical diametersand heights in the 30–300 nm range. Anotherphenomenon, which results in cone sizes around 1 μmor more, is self-masking especially in the case of heterogeneousglasses like borosilicate glass as used in thiscontribution. Thus, a wide range of characteristic sizesand shapes of individual scatterers on the glass surface,jointly acting as a defined roughness, can be achievedresulting in specific optical scattering characteristics. This contribution gives results on borosilicate thin-glassdry etching. Certain surface morphologies are reportedtogether with experimental results on their opticalscattering characteristics.

[学科分类] 电子、光学、磁材料