Properties of Nickel Films Prepared by R.F. Sputtering and Interdiffusion Analysis of Ta2N–Ni Films

[摘要] Ni film deposition by r.f. sputtering and etching conditions have been investigated. The contact resistance andadhesion of this Ni layer deposited directly onto Ta2N films have also been studied in air and at elevatedtemperatures. In this combination, the Ta2N/Ni interdiffusion analysis was carried out by the Secondary IonMass Spectroscopy (SIMS).

[学科分类] 工程和技术（综合）