Optimization of Thick Film Resistors for Low Drift
[摘要] In order to minimize drift in a thick film resistor both printing and trimming parameters have to be optimizedcarefully.With the aid of a linear theoretical model it is shown how the resistance drift in the bulk transition zoneand terminals of the resistor can be calculated for both trimmed and untrimmed resistors.The theoretical results are used for optimization of laser trimmed high ohmic resistors. The experimentalresults are in good agreement with the theoretical predictions and confirm that thick film resistors can beoptimized for low drift.
[发布日期] [发布机构]
[效力级别] [学科分类] 工程和技术(综合)
[关键词] [时效性]