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An X-Ray Technique for Evaluating the Structure of Films for Device Applications
[摘要] Thin films are composed of many crystallites. Where such films are used in the construction of devices it isfrequently necessary to grow them with a preferred orientation. A quick, non destructive method to measure thedegree of orientation could provide a useful guide to device performance. We have investigated a technique toobtain this information using the Philips P.W. 1050/25 diffractometer. The method depends on being able to tiltthe film out of the diffracting plane of the diffractometer and can be used for films in which all crystallites areorientated to better than ±25°, of the preferred direction. This limit is generally acceptable since greater misorientationwill normally produce a poor device. The axial beam divergence of the diffractometer is shown to limitthe accuracy of the technique for very highly orientated films. Experimental Verification of the method is described.
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[效力级别]  [学科分类] 工程和技术(综合)
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