Mechanical and tribological characteristics of a-C:H:SiOx films formed by PACVD on titanium alloy VT1-0

[摘要] This paper is devoted to the study of the mechanical and tribological properties of a-C:H:SiOx films deposited on a titanium alloy VT1-0 by a plasma chemical deposition method using pulsed bipolar bias voltage. It was shown that after deposition of 2 μm-thick a-C:H:SiOx film on a titanium alloy VT1-0 sample, the root-mean-square surface roughness Rq measured using atomic force microscopy decreased from 74 to 50 nm compared to the original substrate. The surface hardness H measured using nanoindentation increased from 3.3 to 12.4 GPa with an almost unchanged elasticity modulus E. As a result, the plasticity index (H/E) of titanium samples increased from 0.03 to 0.11, and the plastic deformation resistance (H 3/E 2) increased from 3 to 156 MPa. Deposition of a-C:H:SiOx film on the titanium alloy VT1-0 surface makes possible to reduce the friction coefficient from 0.3-0.6 to 0.1 and the wear rate from 6 • 10-4 to 7•10-6 mm3/Nm.

[发布机构] Institute of High Current Electronics, SBRAS, 2/3 Akademichesky Avenue, Tomsk; 634055, Russia^1;National Research Tomsk Polytechnic University, 30 Lenina Avenue, Tomsk; 634050, Russia^2

[效力级别] 医药卫生

[关键词] Chemical deposition method;Deformation resistance;Elasticity moduli;Friction coefficients;Mechanical and tribological properties;Plasticity indices;Surface hardness;Tribological characteristics