Investigation of the topography of magnetron-deposited Cu/Ni multilayers by X-ray reflectometry and atomic force microscopy
[摘要]
[发布日期] [发布机构]
[效力级别] [学科分类] 光谱学
[关键词] multilayers Cu/Ni;X-ray reflectometry (XRR);atomic force microscopy (AFM);roughness [时效性]
