Metrology of Mo/Si multilayer mirrors at 13.5 nm with the use of a laser-produced plasma extreme ultraviolet (EUV) source based on a gas puff target
[摘要]
[发布日期] [发布机构]
[效力级别] [学科分类] 光谱学
[关键词] laser-produced plasma extreme ultraviolet (EUV) source;gas puff target;Mo/Si mirrors;EUV spectroscopy [时效性]
