Synthesis and Photosensitivities of Polyethylene Maleate and Epoxy Resin Cinnamate

[摘要] Polyethylene maleate (PEM) and epoxy resin cinnamate (BEC) were prepared to investigate their photosensitivity. Various samples coated on glass plate were exposed to light under various conditions and steeped in the same solvent as used for coating, and then the yield of residual film (W/W0) was calculated. The yield (W/W0), which was closely related to the sensitivity of the film, was affected by the degree of polymerization of the film, light source, sensitizers land their concentration. In polymer homologs, the sensitivity depended upon degree of polymerization. Most effective sensitizers for PEM and BEC among those used here were benzanthrone and 2,6-dichloro-4-nitroaniline.

[学科分类] 化学（综合）