Diamond like carbon coatings deposited by microwave plasma CVD: XPS and ellipsometric studies

[摘要] Diamond-like carbon (DLC) films were deposited by microwave assisted chemical vapour deposition system using d.c. bias voltage ranging from â€�??100 V to â€�??300 V. These films were characterized by X-ray photoelectron spectroscopy (XPS) and spectroscopic ellipsometry techniques for estimating 𝑠ð�?��?³/𝑠ð�?��?² ratio. The 𝑠ð�?��?³/𝑠ð�?��?² ratio obtained by XPS is found to have an opposite trend to that obtained by spectroscopic ellipsometry. These results are explained using sub-plantation picture of DLC growth. Our results clearly indicate that the film is composed of two different layers, having entirely different properties in terms of void percentage and 𝑠ð�?��?³/𝑠ð�?��?² ratio. The upper layer is relatively thinner as compared to the bottom layer.

[学科分类] 材料工程

[关键词] Diamond like carbon films;microwave assisted CVD;X-ray photoelectron spectroscopy;spectroscopic ellipsometry.