Effect of 80 keV Ar+ implantation on the properties of pulse laser deposited magnetite (Fe3O4) thin films

[摘要] Highly oriented thin films of Fe₃O₄ were deposited on (100) LaAlO₃ substrates by pulsed laser ablation. The structural quality of the films was confirmed by X-ray diffraction (XRD). The films showed a Verwey transition near 120 K. The films were subjected to 80 keV Ar⁺ implantation at different ion doses up to a maximum of 6 Ã�? 10¹⁴ ions/cm². Ion beam induced modifications in the films were investigated using XRD and resistance vs temperature measurements. Implantation decreases the change in resistance at 120 K and this effect saturates beyond 3 Ã�? 10¹⁴ ions/cm². The Verwey transition temperature, ð‘�??_ð‘�?, shifts towards lower temperatures with increase in ion dose.

[学科分类] 材料工程

[关键词] Implantation;magnetite;thin films;pulsed laser ablation;Verwey transition.