Si diffusion in GaAs
[摘要] Theoretical studies are carried out to ascertain the dominant mechanism of Si diffusion in GaAs. Lattice dynamical model calculations have shown that the most probable diffusion mechanism is through a single vacancy even though several experiments cannot fix the mechanism as substitutional, substitutionalâ€�?�interstitial pair or neutral defect pair.
[发布日期] [发布机构]
[效力级别] [学科分类] 材料工程
[关键词] Solid state diffusion;lattice dynamics;impurity diffusion. [时效性]