EFFECT OF OXYGEN FLOW RATE ON STRUCTURAL AND OPTICALPROPERTIES OF SnO2 THIN FILMS PREPARED BY APCVD TECHNIQUE

[摘要] Thin films of tin oxide were deposited on glass substrates at temperature 400°C undervarious flow rates of oxygen using atmospheric pressure chemical vapor depositionmethod (APCVD). The synthesized thin films were characterized by X-Ray Diffraction(XRD), UV-VIS spectrophotometer and Field Emission Scanning Electron Microscopy(FE-SEM) to study the structural and optical properties. The results of X-ray diffractionshowed that the crystallite size in these thin films were varied as a result of varyingdeposition conditions, and the average crystalline size was found using Scherrer equationwhich showed decreasing with decreasing the flow rate within (4-8 NL/h). FE-SEMimages of the films showed that the particle size for two samples were 24.2 and 32.3 nmwhich corresponding to flow rates 4 and 5 NL/h respectively. The optical band gaps ofthe films were in the rang (3.72-4.1 eV).

[学科分类] 生物技术

[关键词] Tin oxide;Thin film;Optical properties;APCVD;XRD;FE-SEM