Superconducting nanowire single-photon detectors and sub-10-nm lithography

[摘要] (cont.) The ability to pattern sub-10-nm structures is useful for fabricating future high-performance SNSPDs, nanoimprint lithography molds, prototypes of next generation transistors and storage media, and templates for controlling the self-assembly of block copolymers (BCPs). While this EBL process affords high-resolution, it is inherently a low-throughput process due to the serial nature of the pattern exposure. As a result, EBL is not cost effective in fabricating densely-patterned devices in large volumes. However, coin-bining this top-down EBL process with bottom-up BCP self-assembly techniques, we can simultaneously achieve high resolution without sacrificing throughput or pattern registration. We demonstrated that high-throughput fabrication of a hexagonally-ordered array of posts could be achieved by patterning only a sparse array of posts with EBL and using block copolymers to complete the missing structures.

[发布机构] Massachusetts Institute of Technology