Investigation of capacitance characteristics in metal/high-$k$ semiconductor devices at different parameters and with and without interface state density (traps)

[摘要] Capacitance vs. voltage ($C−V$) curves at AC high frequency of a metal–insulator–semiconductor (MIS) capacitorare investigated in this paper. Bi-dimensional simulations with Silvaco TCAD were carried out to study the effect ofoxide thickness, the surface of the structure, frequency, temperature and fixed charge in the oxide on the $C−V$ curves. We evaluate also the analysis of MIS capacitor structures by different substrate doping concentrations with and without interfacestate density at different temperatures (100, 300 and 600 K). These studies indicate that the doping substrate concentrationand the traps enormously affect the high-frequency $C−V$ curve behaviour. We also demonstrate that for low and hightemperatures, the high-frequency $C−V$ curves behaviour changes, indicating that the capacitance due to the substrate issignificantly influenced in these conditions (bias and substrate doping concentration).

[学科分类] 材料工程

[关键词] $C−V$ characteristic;high-k dielectric;interface state density;MIS structure;nanotechnology;TCAD simulation.