Thickness and photocatalytic activity relation in TiO$_2$:N films grown by atomic layer deposition with methylene-blue and E. coli bacteria
[摘要] This study presents an analysis of the photocatalytic efficiency in TiO$_2$:N thin films grown by atomic layer deposition related to the film thickness. The nitriding process was carried out with nitrogen plasma by molecular nitrogen decomposition after TiO$_2$ deposition. The study was performed using the time-dependent degradation of colour units for methylene-blue solutions and inactivation percentages for Escherichia coli bacteria, for potential applications in sewage purification. To determine the optoelectronic properties of the films, the optical, structural, surface and thickness characterizations were carried out by photoluminescence, Raman spectroscopy, atomic force microscopy and scanning electron microscopy, respectively.
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[效力级别] [学科分类] 材料工程
[关键词] Photocatalytic;atomic layer deposition;anatase phase;photoluminescence;degradation;inactivation. [时效性]