Material selection and nanofabrication techniques for electronic photonic integrated circuits

[摘要] (cont.) By annealing HSQ in a an 02 atmosphere using rapid thermal processing, it is possible to create thick overcladding layers that have essentially the same optical properties as SiO2 with the excellent gap-filling and planarization properties of HSQ. Using XeF2 to locally etch an underlying Si substrate, waveguides with a propagation loss of -10 dB/cm were fabricated out of polysilicon deposited on 50 nm of SiO2.

[发布机构] Massachusetts Institute of Technology