Depth profiling of Al2O3 + TiO2 nanolaminates by means of a time-of-flight energy spectrometer

[摘要] Atomic layer deposition (ALD) is currently a widespread method to grow conformal thin films with a sub-nm thickness control. By using ALD for nanolaminate oxides, it is possible to fine tune the electrical. optical and mechanical properties of thin films. In this study the elemental depth profiles and surface roughnesses were determined for Al2O3 + TiO2 nanolaminates with nominal single-layer thicknesses of 1, 2, 5, 10 and 20 nm and total thickness between 40 nm and 60 nm. The depth profiles were measured by means of a time-of-flight elastic recoil detection analysis (ToF-ERDA) spectrometer recently installed at the University of Jyvaskyla. In TOF-E measurements Cu-63, Cl-35, C-12 and He-4 ions with energies ranging from 0.5 to 10 MeV, were used and depth profiles of the whole nanolaminate film could be analyzed down to 5 nm individual layer thickness. (C) 2011 Elsevier B.V. All rights reserved.

[发布日期] 2011-12-15

[效力级别]  Proceedings Paper

[关键词] ToF-ERDA;ERD;Depth profiling;Al2O3 and TiO2;Nanolaminate;ALD